Device fabrication and real-time electrical monitoring
The SiNW-FET-based single-molecule device was fabricated through point modification and a confinement reaction on the side wall of a SiNW48,53,54. Briefly, after the fabrication of the SiNW-FET array, a gap-opening process was performed using electron beam lithography to create a nanogap on the side wall of the SiNW and expose the Si-H surface after wet-etching by HF-NH4F buffer. Then, through alkyne hydrosilylation of Si-H bonds with undecynoic acid and N-hydroxysuccinimide esterification, active ester terminals were formed for…
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